Silicon tetrachloride, SiCl 4 , is an important chemical used in the manufacture of microelectronic devices. A common impurity in silicon tetrachloride is trichlorosilane, SiHCl 3 . High purity SiCl 4...

Silicon tetrachloride, SiCl₄, is an important chemical used in the manufacture of microelectronic devices. A common impurity in silicon tetrachloride is trichlorosilane, SiHCl₃. High purity SiCl₄
is manufactured by bubbling chlorine Cl₂, gas into unpurified liquid SiCl4. In the presence of ultraviolet light, the dissolved Cl₂
reacts with residual trichlorosilane in the unpurified liquid to form silicon tetrachloride according to the homogeneous reaction;

Estimate the liquid-film mass-transfer coefficient for the transfer of Cl₂
(species A) into liquid SiCl4, assuming pure Cl₂
gas at 298 K and 1.0 atm is bubbled into the liquid SiCl4 with a mean bubble diameter of 2 mm. At 298 K, the density of liquid SiCl₄
is 1.47 g/cm³, the viscosity of liquid SiCl₄
is 0.52 cp, and the liquid diffusivity of Cl₂
in SiCl4 is 5.6
cm²/s. The dissolution of Cl₂
gas in SiCl₄
liquid is defined by
 where H is 6.76 atm at 298 K.

What is the flux of Cl₂, assuming that the Cl₂
is instantaneously consumed once it reaches the bulk liquid phase? You may assume that the total molar concentration of the mixture approximates the molar concentration of pure liquid SiCl₄.