Please answer all the questions with full details to the answersPlease answer the following...

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Please answer all the questions with full details to the answers

Please answer the following questions: 1. Give an example of a thin film coating. How is it deposited and what is the application? 2. Calculate the mean free paths for pressures of (a) 10-5 Torr and (b) 102 Torr. (c)Based on the previous calculation, which pressure would be more suitable for PVD rather than CVD processes and why? 3. What is the Debye shield length in plasmas? 4. What is a plasma sheath? Where and why does it form? 5. Describe ion surface interactions as a function of ion energy. 6. Name one advantage for each of the following PVD techniques: (a) electron beam evaporation deposition, (b) sputter depositions, (c) vacuum arc evaporation deposition. 7. What is reactive magnetron sputter deposition? What type of films can be deposited with this method? 8. Which process parameter is driving the deposition rate in (a) vacuum vapor deposition, (b) sputter deposition and (c) cathodic arc deposition? 9. Briefly describe three characteristics of cathode spots in cathodic vacuum arc discharges. 10. The following curve shows the breakdown voltage versus gas pressure for a given gap distance of two electrodes. This curve has an optimal pressure at which the breakdown voltage is minimal, i.e., the curve has a minimum. Explain why the breakdown voltage increases (a) at lower pressures and (b) at pressures with respect to this minimum.

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Mayuri · Accepted Answer

1) Give an example of a thin film coating. How it deposited and what is is the application?
ANS: Thin film coating is a type of layer that is put on an item that can be as small as fraction of a nanometer to several micrometers in thickness.
An example of a thin film coating can be in mirror glass. It is used to apply behind the mirror so that light can be reflected.
Act of applying a thin film coating to any object is known as deposition. It can be deposited in many ways such as
a) Chemical deposition
When a chemical solution undergoes a chemical change leaving a solid layer.it can be also divided in the step at the chemical solution changes
I. Electroplating
II. Sol-gel
III. Laugmuir-blodgett
IV. Spin coating
V. Dip coating
VI. CVD
VII. ALD
VIII. PECVD
b) Physical deposition
When deposition is done using mechanical, electromechanically, or thermodynamic
c) Growth modes
The formation of a thin film takes place via nucleation and growth processes
i. Volmer–Webe
ii. Stranski-Krastanov growth
iii. Frank-van der Merwe growth
Its application can be as follows
A. Decorative coatings
B. Optical coatings
C. Protective coatings
D. Electrically operating coatings
E. Biosensors and plasmonic devices
F. Thin-film photovoltaic cells
G. Thin-film batteries
H. Thin-film bulk acoustic wave resonators (TFBARs/FBARs)
2) Calculate the mean free paths for pressures of
 (a) 10-5 Torr and 
(b) 102 Torr. 
(c)Based on the previous calculation, which pressure would be more suitable for PVD rather than CVD processes and why?
ANS: Let particular diameter be 330 pm and temperature be 300k then using the formula we can calculate the mean free path.

Please answer the following questions:1. Give an example of a thin film coating. How is it deposited and what is the application?2. Calculate the mean free paths for pressures of(a) 10-5 Torr...

Answer To: Please answer the following questions:1. Give an example of a thin film coating. How is it...

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