Ten observations on etch uniformity on silicon wafers are taken during a qualification experiment for a plasma etcher. Construct a 95 percent confidence interval estimate of both mean and variance....

Ten observations on etch uniformity on silicon wafers are taken during a qualification experiment for a plasma etcher. Construct a 95 percent confidence interval estimate of both mean and variance.

Etch Uniformity<br>5.34<br>6.65<br>4.76<br>5.98<br>7.25<br>6.00<br>7.55<br>5.54<br>5.62<br>6.21<br>

Extracted text: Etch Uniformity 5.34 6.65 4.76 5.98 7.25 6.00 7.55 5.54 5.62 6.21

Jun 08, 2022

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Ten observations on etch uniformity on silicon wafers are taken during a qualification experiment for a plasma etcher. Construct a 95 percent confidence interval estimate of both mean and variance....

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