(a) Sketch the shape of the electric-field distribution versus depth for the
waveguide modulator structures of Problems 9.1 and 9.7c. assuming that the
applied voltages have been adjusted to produce equal waveguide thickness in
each case.
(b) Would the difference in these two field distributions have a more pronounced effect on the profile of Δn versus depth in a lightly doped or
more heavily doped semiconductor substrate.
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