A silicon nitride cantilever beam is defined to be 1000 μm of length by the photomask. After the beam is released (separated from the substrate), the beam changes length due to the tensile stress....

A silicon nitride cantilever beam is defined to be 1000 μm of length by the

photomask. After the beam is released (separated from the substrate), the beam

changes length due to the tensile stress. Calculate the length change if the

tensile (axial) stress is −20 MPa (megaPascals). The Young’s Modulus for

silicon nitride is 280 GPa.